{"product_id":"doping-engineering-for-front-end-processing-b-j-pawlak-9781605110400","title":"Doping Engineering for Front-End Processing: Volume 1070","description":"Materials scientists, silicon technologists and TCAD researchers come together in this book to share experimental results and physical models, discuss achievements and challenges, and identify key issues for future research in this field. The volume focuses on many aspects related to doping of semiconductors (Si, SiGe and Ge) for device fabrication, and explores areas for single-gate as well as multi-gate devices with planar and vertical architectures. Surface properties, coverage, bonding saturation and passivation, and annealing ambient are also discussed.\u003cbr\u003e\u003cbr\u003e\u003cb\u003eAuthor:\u003c\/b\u003e B. J. Pawlak\u003cbr\u003e\u003cb\u003eISBN-10:\u003c\/b\u003e 160511040X\u003cbr\u003e\u003cb\u003eISBN-13:\u003c\/b\u003e 9781605110400\u003cbr\u003e\u003cb\u003ePublisher:\u003c\/b\u003e Cambridge University Press\u003cbr\u003e\u003cb\u003eLanguage:\u003c\/b\u003e English\u003cbr\u003e\u003cb\u003ePublished:\u003c\/b\u003e 10\/17\/2008\u003cbr\u003e\u003cb\u003ePages:\u003c\/b\u003e 336\u003cbr\u003e\u003cb\u003eFormat:\u003c\/b\u003e Hardcover\u003cbr\u003e\u003cb\u003eWeight:\u003c\/b\u003e 1.25lbs\u003cbr\u003e\u003cb\u003eSize:\u003c\/b\u003e 9.20h x 6.30w x 0.90d\u003cbr\u003e\u003cbr\u003e\u003cb\u003eReview Citation(s): \u003c\/b\u003e\u003cbr\u003e\u003ci\u003eScitech Book News\u003c\/i\u003e 12\/01\/2008 pg. 50","brand":"B. J. Pawlak","offers":[{"title":"Hardcover","offer_id":48518962282751,"sku":"9781605110400","price":103.0,"currency_code":"USD","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0662\/2982\/9887\/files\/img_e6ff6a81-d943-49b7-8c40-bc19f6aa7f59.jpg?v=1778736311","url":"https:\/\/www.whiterainbookhouse.com\/products\/doping-engineering-for-front-end-processing-b-j-pawlak-9781605110400","provider":"WR Book House","version":"1.0","type":"link"}