{"product_id":"handbook-for-cleaning-for-semiconductor-karen-a-reinhardt-9780470625958","title":"Handbook for Cleaning for Semiconductor Manufacturing: Fundamentals and Applications","description":"\u003cp\u003e\u003cb\u003eProvides an In-depth discussion of surface conditioning for semiconductor applications\u003c\/b\u003e\u003c\/p\u003e \u003cp\u003eThe \u003ci\u003eHandbook of Cleaning for Semiconductor Manufacturing: Fundamentals and Applications\u003c\/i\u003e provides an in-depth discussion of surface conditioning for semiconductor applications. The fundamental physics and chemistry associated with wet processing is reviewed as well as surface and colloidal aspects of cleaning and etching.\u003c\/p\u003e \u003cp\u003eTopics covered in this new reference include: \u003c\/p\u003e \u003cul\u003e \u003cli\u003eFront end line (FEOL) and back end of line (BEOL) cleaning applications such as high-k\/metal gate post-etch cleaning and pore sealing, high-dose implant stripping and cleaning, and germanium, and silicon passivation\u003c\/li\u003e \u003cli\u003eFormulation development practices, methodology and a new directions are presented including chemicals used for preventing corrosion of copper lines, cleaning aluminium lines, reclaiming wafers, and water bonding, as well as the filtering and recirculating of chemicals including reuse and recycling\u003c\/li\u003e \u003cli\u003eWetting, cleaning, and drying of features, such as high aspect ratio features and hydrophilic surface states, especially how to dry without watermarks, the abilities to wet hydrophobic surfaces and to remove liquid from deep features\u003c\/li\u003e \u003cli\u003eThe chemical reactions and mechanisms of silicon dioxide etching with hydrofluoric acid, particle removal with ammonium hydroxide\/hydrogen peroxide mixture, and metal removal with hydrochloric acid\u003c\/li\u003e \u003c\/ul\u003e \u003cp\u003eThe \u003ci\u003eHandbook of Cleaning for Semiconductor Manufacturing: Fundamentals and Applications\u003c\/i\u003e is a valuable resource for any engineer or manager associated with using or supplying cleaning and contamination free technologies for semiconductor manufacturing. Engineers working for semiconductor manufacturing, capital equipment, chemicals, or other industries that assures cleanliness of chemicals, material, and equipment in the manufacturing area will also find this handbook an indispensible reference.\u003c\/p\u003e\u003cbr\u003e\u003cbr\u003e\u003cb\u003eAuthor:\u003c\/b\u003e Karen A. Reinhardt\u003cbr\u003e\u003cb\u003eISBN-10:\u003c\/b\u003e 0470625953\u003cbr\u003e\u003cb\u003eISBN-13:\u003c\/b\u003e 9780470625958\u003cbr\u003e\u003cb\u003ePublisher:\u003c\/b\u003e Wiley-Scrivener\u003cbr\u003e\u003cb\u003eLanguage:\u003c\/b\u003e English\u003cbr\u003e\u003cb\u003ePublished:\u003c\/b\u003e 01\/11\/2011\u003cbr\u003e\u003cb\u003ePages:\u003c\/b\u003e 614\u003cbr\u003e\u003cb\u003eFormat:\u003c\/b\u003e Hardcover\u003cbr\u003e\u003cb\u003eWeight:\u003c\/b\u003e 2.60lbs\u003cbr\u003e\u003cb\u003eSize:\u003c\/b\u003e 9.90h x 7.10w x 1.30d\u003cbr\u003e\u003cbr\u003e\u003cb\u003eReview Citation(s): \u003c\/b\u003e\u003cbr\u003e\u003ci\u003eReference and Research Bk News\u003c\/i\u003e 04\/01\/2012 pg. 206","brand":"Karen A. Reinhardt","offers":[{"title":"Hardcover","offer_id":43919861448959,"sku":"9780470625958","price":317.95,"currency_code":"USD","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0662\/2982\/9887\/products\/img_9f295afd-5e32-4a3a-b896-affc711ade5b.jpg?v=1680812313","url":"https:\/\/www.whiterainbookhouse.com\/products\/handbook-for-cleaning-for-semiconductor-karen-a-reinhardt-9780470625958","provider":"WR Book House","version":"1.0","type":"link"}