{"product_id":"handbook-of-advanced-semiconductor-technology-guy-rabbat-9789401170581","title":"Handbook of Advanced Semiconductor Technology and Computer Systems","description":"Chapter I describes deposition as a basic microelectronics technique. Plasma enhanced chemical vapor deposition (PECVD) is a technique widely accepted in microelectronics for the deposition of amorphous dielectric films such as silicon nitride and silicon oxide. The main advantage of PECVD stems from the intro- duction of plasma energy to the CVD environment, which makes it possible to promote chemical reactions at relatively low temperatures. A natural extension of this is to use this plasma energy to lower the temperature required to obtain a crystalline deposit. This chapter discusses the PECVD technique and its ap- plication to the deposition of dielectric, semiconductor, and conductor films of interest to microelectronics. Chapter 2 acquaints the reader with the technology and capabilities of plasma processing. Batch etching reactors and etching processes are approaching ma- turity after more than ten years of development. Requirements of anisotropic and selective etching have been met using a variety of reactor configurations and etching gases. The present emphasis is the integration of plasma etching processes into the overall fabrication sequence. Chapter 3 reviews recent advances in high pressure oxidation technology and its applications to integrated circuits. The high pressure oxidation system, oxi- dation mechanisms, oxidation-induced stacking faults, impurity segregation, and oxide quality are described. Applications to bipolar and MOS devices are also presented.\u003cbr\u003e\u003cbr\u003e\u003cb\u003eAuthor:\u003c\/b\u003e Guy Rabbat\u003cbr\u003e\u003cb\u003eISBN-10:\u003c\/b\u003e 9401170584\u003cbr\u003e\u003cb\u003eISBN-13:\u003c\/b\u003e 9789401170581\u003cbr\u003e\u003cb\u003ePublisher:\u003c\/b\u003e Springer\u003cbr\u003e\u003cb\u003eLanguage:\u003c\/b\u003e English\u003cbr\u003e\u003cb\u003ePublished:\u003c\/b\u003e 06\/24\/2012\u003cbr\u003e\u003cb\u003ePages:\u003c\/b\u003e 942\u003cbr\u003e\u003cb\u003eFormat:\u003c\/b\u003e Paperback\u003cbr\u003e\u003cb\u003eWeight:\u003c\/b\u003e 2.91lbs\u003cbr\u003e\u003cb\u003eSize:\u003c\/b\u003e 9.21h x 6.14w x 1.90d","brand":"Guy Rabbat","offers":[{"title":"Paperback","offer_id":48437408661759,"sku":"9789401170581","price":109.99,"currency_code":"USD","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0662\/2982\/9887\/files\/img_ac70499d-5c1a-4b76-9ebc-6a0af869225b.jpg?v=1777161613","url":"https:\/\/www.whiterainbookhouse.com\/products\/handbook-of-advanced-semiconductor-technology-guy-rabbat-9789401170581","provider":"WR Book House","version":"1.0","type":"link"}