Advanced Lithography (Hardcover) (ISBN-13: 9781632380166)

This book presents state-of-the-art information regarding the extensive field of advanced lithography. Advanced lithography expands into numerous sub-fields like micro electro-mechanical system (MEMS), nano-lithography, nano-physics, etc. In optimized electron device, nano-lithography reaches up to 20 nm in size. Subsequently, we have to analyze and develop true single nanometer size lithography. One of the solutions is to analyze a fusion of bottom up and top down technologies like EB drawing and self-assembly with block copolymer. In nano-photonics and MEMS, 3D structures are required for carrying out specific functions in the devices for applications. They are formed as a result of execution of numerous techniques like stereo-lithography, sputtering, colloid lithography, deposition, dry etching, etc. This book provides the readers with valuable information about nano structure, 3D structure, nano-lithography, and elucidates the methodology, techniques and applications of nano-lithography.

Author: Burton Kohler
ISBN-10: 1632380161
ISBN-13: 9781632380166
Publisher: NY Research Press
Language: English
Published: 02/09/2015
Pages: 260
Format: Hardcover
Weight: 1.14lbs
Size: 9.00h x 6.00w x 0.63d