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Apparel Design Through Patternmaking is a fresh design-oriented text that gives fashion students a new perspective on patternmaking knowledge and skills they need to develop contemporary women's, men's, and children's wear. The authors cover a comprehensive range of concepts in flat pattern drafting, such as fit, style, and design development, and their modular approach allows for flexible design options across age, gender, and size, as reflected in current fashion trends. 130 detailed principles address proper measurements; body shapes; dart manipulation; neckline, collar, and sleeve variations; fit issues and corrections; garment details; and more, all of which are easily visualized with hundreds of line drawings and photos. Reference size charts and a decimal conversion chart included in the Appendix make this text user-friendly for international students.
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Injoo Kim is an Associate Professor in the Fashion Design program at the University of Cincinnati. She holds a Masters in Design from the same university. Prior to academia, she worked in the fashion industry for ten years. Professor Kim's research and scholarly work has resulted in multiple publications; she has authored articles on the subjects of apparel design, flat pattern, and machine knitting and three books including Apparel Design through Patternmaking (Fairchild Books, 2002).
Myoung Kim is a lecturer in the Department of Clothing and Textiles at Hanyang University, as well as a visiting scholar at the University of Cincinnati. She holds a PhD in Clothing and Textiles from Hanyang University. Prior to academia, she worked as pattern maker and technical designer in the fashion industry for fourteen years. Dr. Kim's research and scholarly work focuses on the proper fit for menswear and menswear pattern making. Zachary Hoh is an Adjunct Professor and Fashion Design Program Coordinator at the University of Cincinnati.Thanks for subscribing!
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