CMOS Gate-Stack Scaling - Materials, Interfaces and Reliability Implications (Hardcover) (ISBN-13: 9781605111285)

To address the increasing demands of device scaling, new materials are being introduced into conventional Si CMOS processing at an unprecedented rate. Presentations collected here focus on understanding, from a chemistry and materials perspective, the mechanism of interface formation and defects at interfaces, for both conventional Si and alternative channel (Ge or III-V) systems. Several papers address reliability concerns for high-k/metal gate (basic physical models, charge trapping, etc.), while others cover characterization of the thin films and interfaces which comprise the gate stack. Topics include: advanced Si-based gate stacks; and alternate channel materials.

Author: Alexander A. Demkov
ISBN-10: 1605111287
ISBN-13: 9781605111285
Publisher: Cambridge University Press
Language: English
Published: 11/19/2009
Pages: 194
Format: Hardcover
Weight: 0.85lbs
Size: 9.20h x 6.10w x 0.60d