Development of Interference Lithography Capability Using a Helium Cadmium Ultraviolet Multimode Laser for the Fabrication of Sub-Micron-Structured Opt by Crozier, Stanley D.

Development of Interference Lithography Capability Using a Helium Cadmium Ultraviolet Multimode Laser for the Fabrication of Sub-Micron-Structured Opt (Paperback) (ISBN-13: 9781249829553)

Vendor: Stanley D. Crozier
Product type: Books
Format: Paperback
$57.95
$57.95
$57.95
Subtotal: $57.95
Development of Interference Lithography Capability Using a Helium Cadmium Ultraviolet Multimode Laser for the Fabrication of Sub-Micron-Structured Opt by Crozier, Stanley D.

Development of Interference Lithography Capability Using a Helium Cadmium Ultraviolet Multimode Laser for the Fabrication of Sub-Micron-Structured Opt

$57.95
Development of Interference Lithography Capability Using a Helium Cadmium Ultraviolet Multimode Laser for the Fabrication of Sub-Micron-Structured Opt by Crozier, Stanley D.

Development of Interference Lithography Capability Using a Helium Cadmium Ultraviolet Multimode Laser for the Fabrication of Sub-Micron-Structured Opt

$57.95
Format: Paperback
Description
Description
x
The goal of this work is to develop unique holograms on a semiconductor-metal thin films to characterize as potential metamaterials. This is achievable by developing a fabrication recipe to include exposure methods, exposure dosages, and material development. This study developed an interference lithography capability at AFIT for the first time with period resolution below 230nm. It also identified initial acceptable photoresist materials and exposure dosages, and a path to follow to optimize this process.

Author: Stanley D. Crozier
ISBN-10: 1249829550
ISBN-13: 9781249829553
Publisher: Biblioscholar
Language: English
Published: 10/17/2012
Pages: 96
Format: Paperback
Weight: 0.41lbs
Size: 9.69h x 7.44w x 0.20d

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