Plasma Etching: Fundamentals and Applications (Hardcover) (ISBN-13: 9780198562870)

This book focuses on the remarkable recent advances in understanding low pressure radio frequency glow discharges. It explains the basic analytical theory, plasma physics, and plasma diagnostics, before proceeding to the details of the etching process.

Author: M. Sugawara
ISBN-10: 019856287X
ISBN-13: 9780198562870
Publisher: Oxford University Press, USA
Language: English
Published: 07/30/1998
Pages: 356
Format: Hardcover
Weight: 1.50lbs
Size: 9.21h x 6.14w x 0.81d